Growth of thin, hydrous oxide films at Pd electrodes

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dc.contributor.authorBirss, Viola I.en
dc.contributor.authorZhang, Aubrey J.en
dc.contributor.authorGaur, Montyen
dc.date.accessioned2007-09-10T20:01:55Z
dc.date.available2007-09-10T20:01:55Z
dc.date.issued1995
dc.description.refereedYesen
dc.identifier.citationZhang, A. J., Gaur, M. and Birss, V. I. (1995). "Growth of thin, hydrous oxide films at Pd electrodes." Journal of Electroanalytical Chemistry, Vol. 389: 149-159.en
dc.identifier.doihttp://dx.doi.org/10.11575/PRISM/35201
dc.identifier.issn0022-0728
dc.identifier.urihttp://hdl.handle.net/1880/44958
dc.language.isoengen
dc.publisherElsevieren
dc.publisher.corporateUniversity of Calgaryen
dc.publisher.facultyScienceen
dc.publisher.urlhttp://www.elsevier.com/wps/find/journaldescription.cws_home/504087/description#descriptionen
dc.subjectChemistryen
dc.subjectAnalytical chemistryen
dc.titleGrowth of thin, hydrous oxide films at Pd electrodesen
dc.typejournal article
thesis.degree.disciplineChemistryen
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